Researchers at Kanazawa University, in collaboration with Diamond and Carbon Applications (Germany), have developed a ...

Deep reactive ion etching (DRIE) is a highly anisotropic plasma etching process that creates deep, near-vertical features in silicon and related microfabrication materials. DRIE extends ordinary ...

Fabrication of 3D NAND devices involves a challenging and complex deposition and etch process. Two etch processes have been identified as substantially impacting 3D NAND product yields: silicon ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

As any good metallurgist will tell you, you can't just take any two types of metal and weld them together. You may instead be able to just join them together with glue, however, thanks to research ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...