(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...

Toshiba Corporation (TOKYO: 6502) and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

SANTA CLARA, Calif. — A war of words of sorts emerged this week at the SPIE Advanced Lithography conference among vendors developing source mask optimization (SMO) tools in hopes of extending 193-nm ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...

There is growing concern over the impact the photomask has on the semiconductor industry's ability to develop new designs. As the industry shifts emphasis from computer-driven products to ...

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

Hardware Dell's CES 2026 chat was the most pleasingly un-AI briefing I've had in maybe 5 years Graphics Cards 'It is basically DLSS. That’s the way graphics ought to be': Nvidia's Jensen Huang has a ...