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Mesoporous silicon: Etching technique reveals unique electronic transport propertiesSilicon is the best-known semiconductor material. However, controlled nanostructuring drastically alters the material's properties. Using a specially developed etching apparatus, a team at HZB has ...
After removing the bulk of the material, Ken uses a product called Armor Etch to remove some silicon dioxide. Armor Etch apparently comes from craft stores, used to etch glassware with silhouettes ...
We’ve been eagerly following [ProjectsInFlight]’s stepwise journey toward DIY semiconductors, including all the ups and downs, false leads, and tedious optimizations needed to make it possible ...
Source: Lam Research Used for several decades, etch is an essential process in the fab. In a simple process flow, a system deposits silicon dioxide materials on a wafer. A lithography system then ...
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Plasma technique doubles etch rate for 3D NAND flash memoryWhen silicon nitride and silicon oxide were tested separately, the etch rate increased for the nitride and the oxide layer using the hydrogen fluoride plasma instead of the separate hydrogen and ...
Anisotropic wet etching is a common method for fabricating nanowires from various materials, such as silicon, germanium, or III-V semiconductors. By using etchants with high selectivity for specific ...
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